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Mathias Karl Heinrich Plappert

Untersuchungen an diffusionsstabilen Aluminium-Silizium Barrieren für die Halbleiter in der Leistungselektronik

Universität Rostock, 2014

Abstract: The present thesis investigates WTi- and WTiN-diffusion barriers. The physical and chemical properties were evaluated on the basis of experimental, theoretical and simulation data as a function of the sputtering process. The influence of the thin film characteristics on barrier stability is analyzed with the help of accelerated reliability tests and analytical methods. The integration of long term stable diffusion barriers is a further constituent of this work.

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