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Yi-Ling Chen

Plasma diagnostics applying K-line emission profiles of Si and Ar

Universität Rostock, 2015

Abstract: Modifications of K-line profiles due to a warm dense plasma environment are a suitable tool for plasma diagnostics since X-ray emissions strongly depend on the ion configuration an emitter environment. The plasma environment leads to a red shift increasing at higher free electron density and rising temperature. Alternatively, excited states and ionized emitter configurations lead to a blue shift. Both shifts have been taken into account for the calculation of line profiles of silicon and argon.

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